Breaking News: MIIT Yana Haɓaka Injinan Lithography na cikin gida na DUV tare da daidaiton ≤8nm mai rufi

A cikin 'yan watannin nan, Ma'aikatar Masana'antu da Fasahar Watsa Labarai (MIIT) ta ba da "Sharuɗɗa don Gabatarwa da Aiwatar da Manyan Kayayyakin Fasaha na Farko (Set) (2024 Edition)". Wannan yana buɗe hanya don cikakken tsari na gano manyan masana'antar guntu don nodes sama da 28nm!

Kodayake fasahar 28nm ba ta yanke-baki ba, tana da mahimmanci a matsayin layin rarraba tsakanin ƙananan-zuwa-tsakiyar-ƙarshen da tsakiyar-zuwa-ƙarshen kwakwalwan kwamfuta. Baya ga ci-gaba na CPUs, GPUs, da kwakwalwan AI, yawancin kwakwalwan kwamfuta masu darajar masana'antu sun dogara da fasahar 28nm ko mafi girma.

Ƙa'idar Aiki: Ci gaba a cikin Zurfin Ultraviolet Lithography

KrF (Krypton Fluoride) da ArF (Argon Fluoride) na'urorin lithography sun faɗo ƙarƙashin rukunin Deep Ultraviolet (DUV) lithography. Dukansu suna amfani da takamaiman tsayin haske da aka tsara ta hanyar tsarin gani a kan shimfidar hoto mai ɗaukar hoto na wafer silicon, suna canza yanayin da'ira mai rikitarwa.

Injin Lithography na KrF: Yi amfani da tushen haske mai tsayin tsayin 248nm, cimma ƙuduri ƙasa da 110nm, wanda ya dace da hanyoyin masana'antu daban-daban.

Injin Lithography na ArF: Yi amfani da tushen haske mai tsayi na 193nm, yana ba da ƙuduri mafi girma don fasahar aiwatar da sub-65nm, yana ba da damar ƙirƙira mafi kyawun da'irori.

Muhimmancin Fasaha: Haɓaka Masana'antu da Dogaro da Kai

Haɓaka waɗannan injunan lithography suna nuna babban ci gaba a cikin haɓaka masana'antu na semiconductor da samun cin gashin kan masana'antu:

Nasarar Fasaha: Nasarar ƙirƙirar injunan lithography na KrF da ArF yana nuna babban ci gaba a fasahar lithography mai tsayi, yana ba da goyan bayan fasaha mai ƙarfi don masana'antar semiconductor.

Haɓaka Masana'antu: Injunan lithography masu inganci suna ba da damar samar da ƙarin hadaddun da'irori masu ƙarfi da haɓaka, haɓaka sabbin abubuwa a duk sarkar darajar semiconductor.

Tsaron Tattalin Arziki da Ƙasa: Ta hanyar rage dogaro ga fasahar ketare, waɗannan injuna suna ƙarfafa wadatar masana'antar semiconductor na cikin gida, suna ƙarfafa tsaro na tattalin arziki da masana'antu.

Mai Chiller Ruwa : Makullin Ƙarfafa Ayyukan Injin Lithography

Madaidaicin sarrafa zafin jiki yana da mahimmanci don tabbatar da inganci da yawan amfanin aikin lithography. Chillers na ruwa, a matsayin ginshiƙan sassan tsarin sanyaya, suna taka muhimmiyar rawa:

Bukatun sanyaya: Injinan lithography suna da matuƙar kula da jujjuyawar zafin jiki yayin fallasa, suna buƙatar masu sanyaya ruwa waɗanda ke ba da ingantaccen ingantaccen sarrafa zafin jiki.

Ayyuka na Chillers: Ta hanyar watsa ruwa mai sanyaya, chillers yadda ya kamata ya watsar da zafi da aka haifar yayin aiki, kiyaye kayan aikin laser a cikin yanayin zafi mafi kyau da kuma tabbatar da daidaito da aminci a cikin tsarin lithography.

TEYU Chiller Yana Ba da Maganin Ciwon Sanyi na Kwararru don Injin Lithography

TEYU CWUP jerin ultrafast Laser chillers na iya samar da daidaitaccen sarrafa yanayin zafin jiki don injunan lithography. Samfurin chiller CWUP-20ANP yana samun kwanciyar hankali na zafin jiki na ± 0.08 ° C, yana ba da ingantaccen sanyaya don samar da daidaito.

A cikin madaidaicin duniyar masana'antar semiconductor, injunan lithography sune ainihin na'urorin don canja wurin ƙirar microcircuit. Tare da ci gaban fasaha, krypton fluoride lithography inji da argon fluoride lithography inji sun zama wani muhimmin karfi don inganta ci gaban masana'antu tare da kyakkyawan aikin su.