Iindaba ezimnandi: I-MIIT iKhuthaza ooMatshini be-DUV basekhaya beLithography abane-≤8nm ukuChaneka kokuSoleka

Kwiinyanga zamva nje, uMphathiswa wezoShishino kunye neTekhnoloji yoLwazi (MIIT) ukhuphe "Izikhokelo zokuKhuthaza kunye nokuSebenza kokuQala (iSeti) iSixhobo esiPhezulu soBugcisa (uHlelo lwe-2024)". Oku kuvula indlela yenkqubo epheleleyo yokwenziwa kwasekhaya kwetshiphu evuthiweyo kwiindawo ezingaphezulu kwe-28nm!

Nangona itekhnoloji ye-28nm ingeyiyo i-cutting-edge, ibambe ukubaluleka okubalulekileyo njengomgca wokuhlula phakathi kwe-low-to-mid-end kunye ne-mid-to-high-end chips. Ngaphandle kwee-CPU eziphambili, ii-GPU, kunye neetshiphusi ze-AI, uninzi lweetshiphusi ezikumgangatho weshishini zixhomekeke kwi-28nm okanye itekhnoloji ephezulu.

Umgaqo wokuSebenza: Ukuqhubela phambili kwi-Deep Ultraviolet Lithography

I-KrF (i-Krypton Fluoride) kunye ne-ArF (i-Argon Fluoride) oomatshini bezinto zokubhala bawela phantsi kodidi lwe-Deep Ultraviolet (DUV) lithography. Zombini zisebenzisa amaza okukhanya athile aqikelelwa kwiinkqubo zamehlo kwifotoresist umaleko we-silicon wafer, ukuhambisa iipateni zesekethe ezintsonkothileyo.

Oomatshini be-KrF Lithography: Sebenzisa umthombo wokukhanya wamaza angama-248nm, ukufikelela kwizigqibo ezingaphantsi kwe-110nm, ezifanelekileyo kwiinkqubo ezahlukeneyo zokwenziwa kweesekethe ezidibeneyo.

Oomatshini beArF Lithography: Sebenzisa umthombo wokukhanya wamaza we-193nm, obonelela ngesisombululo esiphezulu sobuchwephesha benkqubo engaphantsi kwe-65nm, evumela ukwenziwa kweesekethe ezicolekileyo.

Ukubaluleka kwezobuGcisa: uPhuculo lweShishini kunye nokuZimela

Ukuphuhliswa kwaba matshini bokubhala kuphawula inyathelo elibalulekileyo ekuqhubeleni phambili ukwenziwa kwe-semiconductor kunye nokufezekisa ukuzimela kwemizi-mveliso.:

Ukuphumelela kwezobuGcisa: Ukwenziwa ngempumelelo koomatshini be-KrF kunye ne-ArF lithography kuqaqambisa inkqubela phambili ebalulekileyo kubuchwepheshe bobugcisa bokugqibela, ukubonelela ngenkxaso yobugcisa eyomeleleyo yokwenziwa kwesemiconductor.

Uphuculo lweshishini: Imishini ye-lithography ephezulu echanekileyo yenza ukuveliswa kweesekethe ezidityanisiweyo eziyinkimbinkimbi kunye nokusebenza okuphezulu, ukuqhuba ukuveliswa kwezinto ezintsha kulo lonke ikhonkco lexabiso le-semiconductor.

Ukhuseleko lwezoQoqosho nolweSizwe: Ngokunciphisa ukuxhomekeka kubuchwephesha bamazwe angaphandle, aba matshini bomeleza ukuzimela kweshishini lasekhaya le-semiconductor, bomeleza ukhuseleko lwezoqoqosho nezoshishino.

I-Chiller yamanzi : Isitshixo sokuSebenza koMshini weLithography eZinzile

Ulawulo oluchanekileyo lobushushu luyimfuneko ekuqinisekiseni umgangatho kunye nesivuno senkqubo ye-lithography. Izikhenkcezisi zamanzi, njengezona nxalenye zingundoqo zeenkqubo zokupholisa, zidlala indima ebalulekileyo:

IiMfuno zokupholisa: Oomatshini beLithography banovelwano kakhulu ekuguquguqukeni kobushushu ngexesha lokuvezwa, kufuneke i-chillers yamanzi ebonelela ngolawulo oluchanekileyo noluzinzileyo lobushushu.

Imisebenzi yeChillers: Ngokujikeleza kwamanzi okupholisa, ii-chillers zichitha ngokufanelekileyo ukushisa okwenziwa ngexesha lokusebenza, ukugcina izixhobo ze-laser ngaphakathi komgangatho wokushisa ofanelekileyo kunye nokuqinisekisa ukuchaneka nokuthembeka kwinkqubo ye-lithography.

I-TEYU Chiller ibonelela ngeZisombululo zoBuchule zokuPholisa koomatshini beLithography

Uchungechunge lwe-TEYU CWUP i-ultrafast laser chillers inokubonelela ngolawulo oluchanekileyo kunye noluzinzileyo lweqondo lokushisa koomatshini be-lithography. I imodeli chiller CWUP-20ANP ifezekisa uzinzo lobushushu be ±0.08°C, ukuhambisa ukupholisa okusebenzayo kakhulu kwimveliso echanekileyo.

Kwihlabathi elichanekileyo lokwenziwa kwe-semiconductor, oomatshini be-lithography zixhobo eziphambili zokudluliselwa kweepatheni ze-microcircuit. Ngenkqubela phambili yetekhnoloji, umatshini we-krypton fluoride lithography kunye nomatshini we-argon fluoride lithography baye baba yinto ebalulekileyo yokukhuthaza uphuhliso lweshishini kunye nokusebenza kwabo okugqwesileyo.