Akụkọ na-agbasa: MIIT na-akwalite igwe DUV Lithography nke ụlọ yana ≤8nm machie nke ọma

N'ime ọnwa ndị na-adịbeghị anya, Ministry of Industry and Information Technology (MIIT) nyere "Ntuziaka maka Nkwalite na Ngwa nke Mbụ (Set) Isi Ngwá Ọrụ Ngwá Ọrụ (2024 Edition)". Nke a na-emeghe ụzọ maka nhazi nhazi zuru oke nke nrụpụta mgbawa tozuru oke maka ọnụ karịa 28nm!

Ọ bụ ezie na teknụzụ 28nm adịghị egbutu ọnụ, ọ na-ejide ihe dị mkpa dị ka ahịrị nkewa n'etiti obere-na-mid-end na etiti-na-elu-end ibe. Ewezuga CPUs dị elu, GPUs, na ibe AI, ọtụtụ ibe ụlọ ọrụ mmepụta ihe na-adabere na teknụzụ 28nm ma ọ bụ karịa.

Ụkpụrụ na-arụ ọrụ: Ọganihu na omimi Ultraviolet Lithography

KrF (Krypton Fluoride) na ArF (Argon Fluoride) igwe lithography dara n'okpuru ụdị nke Deep Ultraviolet (DUV) lithography. Ha abụọ na-eji ogologo ogologo ọkụ akọwapụtara site na sistemu ngwa anya na oyi akwa fotoresist nke silicon wafer, na-ebufe ụkpụrụ sekit dị mgbagwoju anya.

Igwe Lithography nke KrF: Jiri isi iyi ọkụ nke 248nm, na-eme mkpebi n'okpuru 110nm, dabara maka usoro nrụpụta sekit dị iche iche jikọtara ọnụ.

ArF Lithography Machines: Jiri isi iyi ọkụ 193nm dị ogologo, na-enye mkpebi dị elu maka teknụzụ usoro sub-65nm, na-enyere aka imepụta sekit kacha mma.

Nkà na ụzụ dị mkpa: Mmelite ụlọ ọrụ na ịdabere na onwe ya

Mmepe nke igwe lithography ndị a bụ nnukwu ihe dị mkpa n'ịkwalite mmepụta semiconductor na inweta nnwere onwe ụlọ ọrụ.:

Ọganihu nka nka: Imepụta nke ọma nke igwe lithography KrF na ArF na-egosipụta ọganihu dị ukwuu na teknụzụ lithography dị elu, na-enye nkwado teknụzụ siri ike maka nrụpụta semiconductor.

Mmelite ụlọ ọrụ: Igwe lithography dị elu na-eme ka mmepụta nke sekit agbakwunyere dị mgbagwoju anya na arụmọrụ dị elu, na-ebugharị ihe ọhụrụ n'ofe dum semiconductor uru yinye.

Nchekwa akụ na ụba na nke mba: Site na ibelata ịdabere na teknụzụ mba ofesi, igwe ndị a na-ewusi ụlọ ọrụ semiconductor nke ụlọ ahụ ike nke onwe, na-akwalite nchekwa akụ na ụba na ụlọ ọrụ mmepụta ihe.

Mmiri mmiri oyi : Igodo na-arụ ọrụ igwe Lithography Stable

Njikwa okpomọkụ nke ọma dị mkpa iji hụ na mma na mkpụrụ nke usoro lithography. Igwe mmiri na-ekpo ọkụ, dị ka akụkụ bụ isi nke sistemu jụrụ oyi, na-arụ ọrụ dị mkpa:

Achọrọ jụrụ oyi: Igwe lithography na-enwe mmetụta nke ukwuu maka mgbanwe okpomọkụ n'oge mkpughe, na-achọ ka chillers mmiri na-enye njikwa okpomọkụ ziri ezi ma kwụsie ike.

Ọrụ nke Chillers: Site n'ikesa mmiri jụrụ oyi, chillers na-ekpochapụ ọkụ na-emepụta n'oge a na-arụ ọrụ, na-edobe ngwá ọrụ laser n'ime oke okpomọkụ kachasị mma ma hụ na izi ezi na ntụkwasị obi na usoro lithography.

TEYU Chiller na-enye ngwọta jụrụ oyi maka igwe lithography

TEYU CWUP usoro ultrafast laser chillers nwere ike inye njikwa okpomọkụ ziri ezi maka igwe lithography. Nke chiller nlereanya CWUP-20ANP enweta okpomọkụ kwụsie ike nke ±0.08°C, na-ebuga nju oyi na-arụ ọrụ nke ọma maka nrụpụta nkenke.

N'ime ụwa zuru oke nke nrụpụta semiconductor, igwe lithography bụ ngwaọrụ bụ isi maka ịnyefe ụkpụrụ microcircuit. Site na ọganihu nke nkà na ụzụ, krypton fluoride lithography igwe na argon fluoride lithography igwe aghọwo ihe dị mkpa iji kwalite mmepe nke ụlọ ọrụ na arụmọrụ ha dị mma.