Cov Xov Xwm Tshaj Tawm: MIIT Txhawb Nqa Hauv Tsev DUV Lithography Machine nrog ≤8nm Overlay Accuracy

Nyob rau hauv lub hlis tsis ntev los no, Ministry of Industry thiab Information Technology (MIIT) tau tshaj tawm "Cov Lus Qhia rau Kev Tshaj Tawm thiab Kev Siv Ua Ntej (Tshooj) Cov Khoom Siv Tseem Ceeb (2024 Edition)". Qhov no ua rau txoj hauv kev rau kev ua haujlwm puv npo ntawm kev tsim cov chips paub tab rau cov nodes saum 28nm!

Txawm hais tias 28nm thev naus laus zis tsis yog kev txiav-ntug, nws tuav qhov tseem ceeb raws li kev faib kab ntawm qis-rau-nruab nrab-kawg thiab nruab nrab-rau-siab-kawg chips. Ib sab ntawm cov CPUs siab heev, GPUs, thiab AI chips, feem ntau cov qib kev lag luam cia siab rau 28nm lossis siab dua thev naus laus zis.

Txoj Cai Ua Haujlwm: Kev nce qib hauv Deep Ultraviolet Lithography

KrF (Krypton Fluoride) thiab ArF (Argon Fluoride) lithography tshuab poob rau hauv qeb ntawm Deep Ultraviolet (DUV) lithography. Ob leeg siv lub teeb wavelengths tshwj xeeb los ntawm cov tshuab kho qhov muag mus rau cov txheej txheem photoresist ntawm silicon wafer, hloov cov qauv hauv Circuit Court intricate.

KrF Lithography tshuab: Siv 248nm wavelength lub teeb qhov chaw, ua tiav cov kev daws teeb meem hauv qab 110nm, haum rau ntau yam kev tsim hluav taws xob sib txuas.

ArF Lithography tshuab: Siv 193nm wavelength lub teeb qhov chaw, muab kev daws teeb meem siab dua rau sub-65nm cov txheej txheem thev naus laus zis, ua rau kev tsim cov kab hluav taws xob zoo dua.

Technological tseem ceeb: Kev Txhim Kho Kev Lag Luam thiab Kev Ntseeg Tus Kheej

Txoj kev loj hlob ntawm cov tshuab lithography no yog qhov tseem ceeb hauv kev nce qib semiconductor kev tsim khoom thiab ua tiav kev lag luam autonomy.:

Technical Breakthroughs: Kev ua tiav ntawm KrF thiab ArF lithography tshuab qhia txog kev nce qib hauv high-end lithography technology, muab kev txhawb zog rau kev tsim khoom semiconductor.

Kev Txhim Kho Kev Lag Luam: High-precision lithography cov cav tov pab kom tsim tau cov complex thiab high-kev ua tau zoo integrated circuits, tsav innovation nyob rau hauv tag nrho cov semiconductor nqi saw.

Kev Lag Luam thiab Kev Ruaj Ntseg Hauv Tebchaws: Los ntawm kev txo qis kev cia siab rau kev siv tshuab txawv teb chaws, cov tshuab no ntxiv dag zog rau kev lag luam semiconductor kev lag luam tus kheej txaus, txhawb kev lag luam thiab kev ruaj ntseg.

Dej Chiller : Tus yuam sij rau Stable Lithography Machine Performance

Kev tswj qhov kub thiab txias yog qhov tseem ceeb rau kev ua kom zoo thiab tawm los ntawm cov txheej txheem lithography. Dej chillers, ua cov khoom tseem ceeb ntawm cov tshuab ua kom txias, ua lub luag haujlwm tseem ceeb:

Kev xav tau cua txias: Cov tshuab lithography yog qhov tsis tshua muaj siab rau qhov kub thiab txias hloov thaum raug, yuav tsum tau siv cov dej chillers uas muab kev tswj xyuas qhov kub thiab txias.

Muaj nuj nqi ntawm Chillers: Los ntawm cov dej txias txias, chillers zoo dissipate cua sov tsim thaum lub sijhawm ua haujlwm, tswj cov khoom siv laser nyob rau hauv qhov ntsuas kub thiab ua kom ntseeg tau qhov tseeb thiab kev ntseeg siab hauv cov txheej txheem lithography.

TEYU Chiller Muab Kev Ua Haujlwm Txias Txias rau Lithography Machine

TEYU CWUP series ultrafast laser chillers tuaj yeem muab kev tswj xyuas qhov kub thiab txias rau cov tshuab lithography. Cov chiller qauv CWUP-20ANP achieves kub stability ntawm ±0.08°C, xa cov cua txias kom zoo rau kev tsim khoom.

Nyob rau hauv lub ntiaj teb meej ntawm kev tsim khoom semiconductor, cov tshuab lithography yog cov khoom siv tseem ceeb rau kev hloov ntawm microcircuit qauv. Nrog rau kev nce qib ntawm thev naus laus zis, krypton fluoride lithography tshuab thiab argon fluoride lithography tshuab tau dhau los ua lub zog tseem ceeb los txhawb kev txhim kho kev lag luam nrog lawv cov kev ua tau zoo.