Akụkọ Na-eme Eme: MIIT Na-akwalite Igwe Lithography DUV nke Ụlọ na ≤8nm Overlay Accuracy

N'ime ọnwa ndị na-adịbeghị anya, Ministri nke Ụlọ Ọrụ na Teknụzụ Ozi (MIIT) wepụtara "Ntuziaka maka Nkwalite na Itinye Ngwa Teknụzụ Mbụ (Set) (Mbipụta 2024)". Nke a na-emeghe ụzọ maka ebe nrụpụta chip tozuru oke maka nodes karịrị 28nm!

Ọ bụ ezie na teknụzụ 28nm abụghị nke kachasị mma, ọ dị mkpa dị ka akara nkewa n'etiti chips dị ala ruo etiti na etiti ruo elu. E wezụga CPUs dị elu, GPUs, na chips AI, ọtụtụ chips nke ụlọ ọrụ mmepụta ihe na-adabere na teknụzụ 28nm ma ọ bụ karịa.

Ụkpụrụ Ọrụ: Ọganihu na Lithography Ultraviolet Deep

Igwe lithography KrF (Krypton Fluoride) na ArF (Argon Fluoride) dabara n'ụdị lithography Deep Ultraviolet (DUV). Ha abụọ na-eji ogologo ebili mmiri ìhè kpọmkwem nke a na-atụ anya site na sistemụ anya na oyi akwa photoresist nke wafer silicon, na-ebufe ụkpụrụ sekit dị mgbagwoju anya.

Igwe KrF Lithography: Jiri isi iyi ọkụ 248nm, na-enweta mkpebi dị n'okpuru 110nm, nke dabara adaba maka usoro nrụpụta sekit dị iche iche agbakwunyere.

Igwe ArF Lithography: Jiri isi iyi ọkụ 193nm, na-enye mkpebi dị elu maka teknụzụ usoro sub-65nm, na-eme ka mmepụta nke sekit ndị ka mma.

Mkpa Teknụzụ: Mmelite Ụlọ Ọrụ na Ịdabere n'Ike

Mmepe nke igwe lithography ndị a bụ nnukwu ihe dị mkpa n'ịkwalite mmepụta semiconductor na inweta nnwere onwe ụlọ ọrụ:

Ihe Ndị E Ji Mee Nchọcha Nkà na Ụzụ: Mmepụta igwe KrF na ArF nke ọma na-egosi ọganihu dị ukwuu na teknụzụ lithography dị elu, na-enye nkwado teknụzụ siri ike maka mmepụta semiconductor.

Mmelite Ụlọ Ọrụ: Igwe lithography dị oke nkenke na-eme ka mmepụta nke sekit agbakwunyere dị mgbagwoju anya na arụmọrụ dị elu, na-akwalite ihe ọhụrụ n'ofe usoro uru semiconductor niile.

Nchekwa Akụ na Ụba na Mba: Site n'ibelata ịdabere na teknụzụ mba ọzọ, igwe ndị a na-eme ka ụlọ ọrụ semiconductor nke obodo sie ike, na-eme ka nchekwa akụ na ụba na ụlọ ọrụ mmepụta ihe sikwuo ike.

Mmiri oyi : Isi ihe dị mkpa maka arụmọrụ igwe lithography kwụsiri ike

Njikwa okpomọkụ kpọmkwem dị oke mkpa iji hụ na usoro lithography dị mma ma na-arụpụta ihe. Ihe mkpuchi mmiri, dịka ihe ndị bụ isi na sistemụ oyi, na-arụ ọrụ dị mkpa:

Ihe Ndị Dị Mkpa Iji Mee Ka Oyi Dọọ: Igwe lithography na-enwe mmetụta dị ukwuu na mgbanwe okpomọkụ n'oge a na-ekpughe ya, nke na-eme ka ihe mkpuchi mmiri dị nro nke na-enye njikwa okpomọkụ ziri ezi ma kwụsie ike.

Ọrụ nke ndị na-ekpo ọkụ: Site na ịgbasa mmiri oyi, ndị na-ekpo ọkụ na-ekpochapụ okpomọkụ nke a na-emepụta n'oge ọrụ nke ọma, na-edobe akụrụngwa laser n'ime oke okpomọkụ kachasị mma ma na-ahụ na izi ezi na ntụkwasị obi na usoro lithography.

TEYU Chiller Na-enye Ngwọta Ọfụma Ọkachamara Maka Igwe Lithography

TEYU Igwe oyi laser nke CWUP nke na-arụ ọrụ nke ọma nwere ike inye njikwa okpomọkụ ziri ezi na nke kwụsiri ike maka igwe lithography. Ụdị oyi CWUP-20ANP na-enweta nkwụsi ike okpomọkụ nke ±0.08°C, na-enye oyi dị mma nke ukwuu maka imepụta ihe ziri ezi.

N'ụwa kpọmkwem nke mmepụta semiconductor, igwe lithography bụ ngwaọrụ dị mkpa maka mbufe nke ụkpụrụ microcircuit. Site na ọganihu nke teknụzụ, igwe krypton fluoride lithography na igwe argon fluoride lithography aghọwo ike dị mkpa iji kwalite mmepe nke ụlọ ọrụ ahụ site na arụmọrụ ha dị mma.