Iindaba Ezintsha: I-MIIT Ikhuthaza Oomatshini Be-DUV Lithography Basekhaya Abane-≤8nm Overlay Accuracy

Kwiinyanga zakutshanje, iSebe lezoShishino noLwazi (i-MIIT) likhuphe "Izikhokelo zokuKhuthazwa kunye nokusetyenziswa kweZixhobo zoBugcisa eziPhambili (eziSeti) (uHlelo luka-2024)". Oku kuvula indlela yokwenziwa kwezixhobo ezivuthiweyo kwiindawo ezingaphezulu kwe-28nm!

Nangona iteknoloji ye-28nm ingeyonto iphambili, ibaluleke kakhulu njengomgca owahlula phakathi kweetships eziphakathi ukuya kwezisezantsi neziphakathi ukuya kweziphezulu. Ngaphandle kwee-CPU eziphambili, ii-GPU, kunye neetships ze-AI, uninzi lweetships zomgangatho wezoshishino zixhomekeke kubuchwepheshe be-28nm okanye obuphezulu.

Umgaqo Wokusebenza: Ukuqhubela phambili kwi-Deep Ultraviolet Lithography

Oomatshini be-lithography be-KrF (Krypton Fluoride) kunye ne-ArF (Argon Fluoride) baphantsi kodidi lwe-lithography ye-Deep Ultraviolet (DUV). Zombini zisebenzisa ubude bokukhanya obuthile obuvela kwiinkqubo ze-optical kumaleko we-photoresist we-silicon wafer, zidlulisela iipateni zesekethe ezintsonkothileyo.

Iimashini zeKrF Lithography: Sebenzisa umthombo wokukhanya we-248nm ubude, ufezekise izisombululo ezingaphantsi kwe-110nm, ezifanelekileyo kwiinkqubo ezahlukeneyo zokwenziwa kweesekethe ezidibeneyo.

Iimashini ze-ArF Lithography: Sebenzisa umthombo wokukhanya we-193nm ubude, obonelela ngesisombululo esiphezulu kwiiteknoloji zenkqubo ze-sub-65nm, ovumela ukwenziwa kweesekethe ezincinci.

Ukubaluleka kobuchwephesha: Ukuphucula ishishini kunye nokuzithemba

Uphuhliso lwale mishini ye-lithography luphawula inyathelo elikhulu ekuphuculeni ukwenziwa kwe-semiconductor kunye nokufikelela ekuzimeleni kwemizi-mveliso:

Impumelelo yoBugcisa: Ukudalwa ngempumelelo koomatshini be-lithography be-KrF kunye ne-ArF kubonisa inkqubela phambili ebalulekileyo kubuchwepheshe be-lithography obuphezulu, okubonelela ngenkxaso yobugcisa eqinileyo kwimveliso ye-semiconductor.

Ukuphuculwa kweShishini: Oomatshini be-lithography abachanekileyo kakhulu bavumela ukuveliswa kweesekethe ezidityanisiweyo ezintsonkothileyo nezisebenza kakuhle, nto leyo eqhuba ubuchule kulo lonke uthotho lwexabiso lwe-semiconductor.

Ukhuseleko lwezoQoqosho nolweSizwe: Ngokunciphisa ukuxhomekeka kubuchwepheshe bangaphandle, aba matshini bomeleza ukuzimela kweshishini le-semiconductor lasekhaya, beqinisa ukhuseleko lwezoqoqosho nolwemizi-mveliso.

I-Water Chiller : Isitshixo sokuSebenza koMatshini weLithography oZinzileyo

Ulawulo oluchanekileyo lobushushu lubalulekile ukuqinisekisa umgangatho kunye nemveliso yenkqubo ye-lithography. Ii-water chillers, njengezinto eziphambili zeenkqubo zokupholisa, zidlala indima ebalulekileyo:

Iimfuneko zokuPholisa: Oomatshini beLithography banobuthathaka kakhulu kutshintsho lobushushu ngexesha lokuvezwa, nto leyo ebangela ukuba kufuneke izixhobo zokupholisa amanzi ezibonelela ngolawulo lobushushu oluchanekileyo noluzinzileyo.

Imisebenzi yeeChillers: Ngokujikelezisa amanzi apholisayo, iiChillers zisusa ubushushu obuveliswa ngexesha lokusebenza, zigcina izixhobo zelaser zikwinqanaba elifanelekileyo lobushushu kwaye ziqinisekisa ukuchaneka nokuthembeka kwenkqubo yelithography.

TEYU I-Chiller Inikezela Ngezisombululo Zobungcali Zokupholisa Kwiimashini ZeLithography

TEYU Ii-laser chillers ze-CWUP series ultrafast zinokubonelela ngolawulo lobushushu oluchanekileyo noluzinzileyo kwiimashini ze-lithography. Imodeli ye-chiller ye-CWUP-20ANP ifikelela kuzinzo lobushushu lwe-±0.08°C, inika ukupholisa okusebenzayo kakhulu kwimveliso echanekileyo.

Kwihlabathi elichanekileyo lokwenziwa kwee-semiconductor, oomatshini be-lithography zezona zixhobo ziphambili zokudlulisela iipateni ze-microcircuit. Ngokuhambela phambili kwetekhnoloji, umatshini we-krypton fluoride lithography kunye nomatshini we-argon fluoride lithography ziye zaba ngamandla abalulekileyo ekukhuthazeni uphuhliso lweli shishini ngokusebenza kwazo okugqwesileyo.