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I-VR

Izindaba Ezintsha: I-MIIT Iphromotha Imishini Yasekhaya ye-DUV Lithography eno-≤8nm Ukunemba Kwembondela

Imihlahlandlela ye-MIIT ka-2024 ikhuthaza ukwenziwa kwasendaweni kwenqubo egcwele yokukhiqiza ama-chip angu-28nm+, ingqopha-mlando yobuchwepheshe. Intuthuko ebalulekile ihlanganisa imishini ye-KrF ne-ArF lithography, evumela amasekhethi anembayo kanye nokuthuthukisa ukuzethemba kwemboni. Ukulawulwa kwezinga lokushisa okunembile kubalulekile kulezi zinqubo, ngama-chillers amanzi e-TEYU CWUP aqinisekisa ukusebenza okuzinzile ekukhiqizeni ama-semiconductor.

Disemba 06, 2024

Ezinyangeni ezisanda kwedlula, uMnyango Wezimboni Nobuchwepheshe Bolwazi (MIIT) ukhiphe "Iziqondiso Zokuphromothwa Nokusetshenziswa Kwezisetshenziswa Ezinkulu Zobuchwepheshe Zokuqala (Isethi) (Inguqulo ka-2024)". Lokhu kuvula indlela yokwenziwa kwasendaweni okugcwele kokukhiqizwa kwama-chip avuthiwe kumanodi angaphezu kuka-28nm!


Nakuba ubuchwepheshe be-28nm bungafinyeleleki, bubambe ukubaluleka okubalulekile njengomugqa ohlukanisayo phakathi kwama-chips aphansi kuya maphakathi kanye namaphakathi kuya phezulu. Ngaphandle kwama-CPU athuthukile, ama-GPU, nama-AI chips, ama-chips amaningi ebanga lezimboni ancike ku-28nm noma ubuchwepheshe obuphakeme.


I-MIIT Ithuthukisa Imishini Yasekhaya ye-DUV Lithography enokunemba kokunqwabelanisa okungu-≤8nm


Isimiso Esisebenzayo: Intuthuko ku-Deep Ultraviolet Lithography

Imishini ye-lithography ye-KrF (Krypton Fluoride) kanye ne-ArF (Argon Fluoride) ingena ngaphansi kwesigaba se-Deep Ultraviolet (DUV) lithography. Kokubili kusebenzisa amaza okukhanya athile aklanywe ngamasistimu okukhanya kungqimba lwe-photoresist lwewafa ye-silicon, idlulisela amaphethini wesekethe ayinkimbinkimbi.

Imishini ye-KrF Lithography: Sebenzisa umthombo wokukhanya wamaza wamaza angu-248nm, ufinyelela izinqumo ezingaphansi kuka-110nm, ezifanele izinqubo ezihlukahlukene zokukhiqiza isekethe ehlanganisiwe.

Imishini ye-ArF Lithography: Sebenzisa umthombo wokukhanya we-wavelength ongu-193nm, enikeza ukulungiswa okuphezulu kobuchwepheshe benqubo obungaphansi kwe-65nm, okuvumela ukwenziwa kwamasekhethi angcono kakhulu.


Ukubaluleka Kwezobuchwepheshe: Ukuthuthukiswa Kwemboni Nokuzethemba

Ukuthuthukiswa kwale mishini ye-lithography kuphawula ingqopha-mlando enkulu ekuthuthukisweni kokukhiqizwa kwe-semiconductor kanye nokuzuza ukuzimela kwezimboni:

Ukuthuthuka Kwezobuchwepheshe: Ukwakhiwa ngempumelelo kwemishini ye-lithography ye-KrF ne-ArF kugqamisa inqubekelaphambili ebalulekile kubuchwepheshe be-lithography obusezingeni eliphezulu, okuhlinzeka ngosekelo oluqinile lobuchwepheshe lokukhiqiza i-semiconductor.

Ukuthuthukiswa Kwemboni: Imishini ye-lithography enembayo ephezulu inika amandla ukukhiqizwa kwamasekethe ahlanganisiwe ayinkimbinkimbi futhi asebenza kahle kakhulu, eqhuba ukuqamba okusha kulo lonke uchungechunge lwenani le-semiconductor.

Ukuphepha Kwezomnotho Nezwe: Ngokunciphisa ukuncika kubuchwepheshe bangaphandle, le mishini iqinisa ukuzimela kwemboni ye-semiconductor yasekhaya, iqinisa ukuphepha kwezomnotho nezimboni.


I-Water Chiller : Ukhiye Wokusebenza Komshini Ozinzile we-Lithography

Ukulawula izinga lokushisa okunembile kubalulekile ukuze kuqinisekiswe ikhwalithi kanye nesivuno senqubo ye-lithography. Izibandisi zamanzi, njengezingxenye ezibalulekile zezinhlelo zokupholisa, zidlala indima ebalulekile:

Izidingo Zokupholisa: Imishini ye-Lithography izwela kakhulu ekuguquguqukeni kwezinga lokushisa ngesikhathi sokuchayeka, okudinga ama-chillers amanzi ahlinzeka ngokulawula okunembe kakhulu nezinzile kwezinga lokushisa.

Imisebenzi Yama-Chillers: Ngokujikeleza amanzi okupholisa, ama-chiller akuqeda ngokuphumelelayo ukushisa okukhiqizwa ngesikhathi sokusebenza, ukugcinwa kwemishini ye-laser ngaphakathi kwebanga lokushisa elilungile kanye nokuqinisekisa ukunemba nokuthembeka kwinqubo ye-lithography.


I-Ultrafast laser chiller CWUP-20ANP enokuqina okungu-0.08℃


I-TEYU Chiller Inikeza Izixazululo Zokupholisa Ezichwepheshile zeMishini ye-Lithography

I-TEYU CWUP yochungechunge lwe-ultrafast laser chillers inganikeza ukulawula izinga lokushisa okunembayo futhi okuzinzile kwemishini ye-lithography. Imodeli ebandayo ye-CWUP-20ANP ifinyelela ukuqina kwezinga lokushisa elingu-±0.08°C, iletha ukupholisa okusebenza kahle kakhulu kokukhiqizwa okunembayo.


Ezweni elinembile lokwenziwa kwe-semiconductor, imishini ye-lithography ingamathuluzi abalulekile okudlulisa amaphethini ama-microcircuit. Ngokuthuthuka kobuchwepheshe, umshini we-krypton fluoride lithography kanye nomshini we-argon fluoride lithography kube amandla abalulekile okukhuthaza ukuthuthukiswa komkhakha ngokusebenza kwawo okuhle kakhulu.

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